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	1.	Plasma etching an introduction ed. by Dennis M. Manos and Daniel L. Flamm. by Manos, Dennis M., ed Flamm, Daniel L., ed Series: Plasma-Materials interactions Material type: Text Publication details: Boston Academic press 1989 Availability: Items available for loan: JRD Tata Memorial Library (1)Call number: 530.44 N89. Place hold
	2.	Photon, beam and plasma stimulated chemical processes at surfaces ed. by Vincent M. Donnelly, Irving P. Herman , Masataka Hirose by Symposium on Photon, Beam and Plasma Stimulated Chemical Processeses (1986 Boston) Donnelly, Vincent M., ed. Herman, Irving P., ed. Hirose, Masataka., ed Series: Materials research society symposia proceedings V.75 Material type: Text Publication details: Pittsburg Materials Research Society 1987 Availability: Items available for reference: JRD Tata Memorial Library: Not for loan (1)Call number: 620.11228 N87.
	3.	Handbook of plasma processing technology fundamentals, etching, deposition and surface interactions ed. by Stephen M. Rossnagel, Jerome J. Cuomo, W. D. Westwood by Rossnagel, Stephen M., ed Cuomo, Jerome J., ed Westwoood, W. D., ed Series: Materials science and process technology series Material type: Text Publication details: Park Ridge Noyes publications 1990 Availability: Items available for loan: JRD Tata Memorial Library (1)Call number: 621.044 N90. Place hold
	4.	Physics of thin films Advances in research and development; V.18:Plasma sources for thin films deposition and etching ed. by Maurice H. Francombe, John L. Vossen by Francombe, Maurice H., ed Vossen, John L., ed Material type: Text Publication details: San Diego Academic Press 1994 Availability: Items available for reference: JRD Tata Memorial Library: Not for loan (1)Call number: 530.4105 N63.18 "SER".
	5.	Plasma etching fundamentals and applications by M. Sugawara by Sugawara, M Material type: Text Publication details: New York Oxford University Press 1998 Availability: Items available for loan: JRD Tata Memorial Library (1)Call number: 621.381531 N98;2. Place hold

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