Optimization of HFO2 thin films for gate dielectric applications in 2-D layered materials by Lakshmi Ganapathi K

By: Material type: TextTextPublication details: Bangalore IISc, Dept of AP PhD Thesis 2014Description: xxv, 158pSubject(s): DDC classification:
  • 621.3973201546514 P14
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Item type Current library Call number Status Date due Barcode
Thesis Thesis JRD Tata Memorial Library 621.3973201546514 P14 (Browse shelf(Opens below)) Not for loan T08319

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