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Optimization of HFO2 thin films for gate dielectric applications in 2-D layered materials

Ganapathi K Lakshmi

Optimization of HFO2 thin films for gate dielectric applications in 2-D layered materials by Lakshmi Ganapathi K - Bangalore IISc, Dept of AP PhD Thesis 2014 - xxv, 158p.

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Dewey Class. No.: 621.3973201546514 / P14

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