Plasma etching (Record no. 148033)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00604nam a2200193Ia 4500 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 019856287X |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 |
| Item number | N98;2 |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Sugawara, M. |
| 245 ## - TITLE STATEMENT | |
| Title | Plasma etching |
| Remainder of title | fundamentals and applications |
| Statement of responsibility, etc. | by M. Sugawara |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | New York |
| Name of publisher, distributor, etc. | Oxford University Press |
| Date of publication, distribution, etc. | 1998 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | viii, 347p |
| 690 ## - LOCAL SUBJECT ADDED ENTRY--TOPICAL TERM (OCLC, RLIN) | |
| Topical term or geographic name as entry element | Semiconductors-etching; Plasma etching; |
| 919 ## - | |
| -- | 153685 |
| 964 ## - | |
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| -- | CE |
No items available.
