Atomic layer deposition(ALD) and metalorganic chemical vapour deposition(MOCVD) of metals and metal oxides by Mane Anil Uttam

By: Material type: TextTextSeries: IISc. Dept. of MRC, PhD. thesisPublication details: Bangalore IISc 2003Description: xiv, 180pSubject(s): DDC classification:
  • 620.1699 P03 "THESIS"
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Item type Current library Call number Status Date due Barcode
Thesis Thesis JRD Tata Memorial Library 620.1699 P03 "THESIS" (Browse shelf(Opens below)) Not for loan T05367

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