Stress and microstructural evolution during the growth of transition metal oxide thin films by PVD by Narayanachari K V L V

By: Contributor(s): Material type: TextTextPublication details: Bangalore IISc 2015Description: x, 139pSubject(s): DDC classification:
  • 621.38152 P155 (THESIS)
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Item type Current library Call number Status Date due Barcode
Thesis Thesis JRD Tata Memorial Library 621.38152 P155 (THESIS) (Browse shelf(Opens below)) Not for loan T08826

Includes CD

IISc, Dept of MRC, PhD Thesis

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