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1.
Chemical vapor deposition principles and applications ed by Michael L. Hitchman and Klavs F. Jensen by
Material type: Text Text
Publication details: London Academic Press 1993
Availability: Items available for loan: JRD Tata Memorial Library (1)Call number: 671.735 N93.

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2.
Chemical vapour deposition precursors processes and applications ed by Anthony C Jones and Michael L Hitchman by
Material type: Text Text
Publication details: Cambridge RSC 2009
Availability: Items available for loan: Centre for Nano Science and Engineering (1)Call number: 671.735 P09 (CeNSE).

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