TY  - BOOK
AU  - Narayanachari, K. V. L. V.
AU  - Srinivasan Ragahvan
TI  - Stress and microstructural evolution during the growth of transition metal oxide thin films by PVD
U1  - 621.38152 
PY  - 2015///
CY  - Bangalore
PB  - IISc
KW  - Transition metal oxide thin films; System on chip; System on package; Vapor deposition system
N1  - Includes CD; IISc, Dept of MRC, PhD Thesis
ER  -