Narayanachari, K. V. L. V. <br/><br/>
Stress and microstructural evolution during the growth of transition metal oxide thin films by PVD 
by Narayanachari K V L V 
 - Bangalore  IISc  2015 
 - x, 139p.   
<br/><br/> Includes CD  IISc, Dept of MRC, PhD Thesis 
<br/><br/><label>Subjects--Index Terms: </label>Transition metal oxide thin films; System on chip; System on package; Vapor deposition system 
<br/><br/><label>Dewey Class. No.: </label>621.38152  / P155 (THESIS)