TY  - BOOK
AU  - Jajala, Bujjamma.
AU  - Advised by Mohan, S.
TI  - Ion assisted deposition of hf02 thin films for CMOS gate dielectric applications
U1  - 530.4175 
PY  - 2010///
CY  - Bangalore
PB  - Indian Institute of Science
KW  - Thinfilms-ion sssisted deposition
KW  - Complementary metal oxide semiconductors
KW  - Thin film deposition
N1  - Includes CD and references; MSc(Engg);2010;Instrumentation and Applied Physics
ER  -