Jajala, Bujjamma. <br/><br/>
Ion assisted deposition of hf02 thin films for CMOS gate dielectric applications 
by Bujjamma Jajala 
 - Bangalore :  Indian Institute of Science,  2010. 
 - xii, 80 p. :  col. ill. 
<br/><br/> Includes CD and references. 
<br/><br/>MSc(Engg);2010;Instrumentation and Applied Physics 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Thinfilms-ion sssisted deposition<br/>Complementary metal oxide semiconductors<br/>Thin film deposition
<br/><br/><label>Dewey Class. No.: </label>530.4175  / P10