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Ion assisted deposition of hf02 thin films for CMOS gate dielectric applications by Bujjamma Jajala

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Material type: Text

TextPublication details: Bangalore : Indian Institute of Science, 2010.Description: xii, 80 p. : col. illSubject(s):

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Dissertation note: MSc(Engg);2010;Instrumentation and Applied Physics

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Holdings
Item type	Current library	Call number	Status	Date due	Barcode
Thesis	JRD Tata Memorial Library	530.4175 P10 (Browse shelf(Opens below))	Not for loan		T07212

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Includes CD and references.

MSc(Engg);2010;Instrumentation and Applied Physics

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