Behaviour of electrically stressed thin silicon dioxide (SiO2) films.
Material type: BookSeries: IIsc. Dept. of ECE, Ph.D. ThesisPublication details: Bangalore IISc. 1989Description: v, 114pSubject(s): DDC classification:- 621.38152 N896 "THESIS"
Item type | Current library | Call number | Status | Date due | Barcode |
---|---|---|---|---|---|
Thesis | JRD Tata Memorial Library | 621.38152 N896 "THESIS" (Browse shelf(Opens below)) | Available | T02852 |
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