Developments in semiconductor micro lithography III; V.135 (Record no. 19343)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00604nam a2200193Ia 4500 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 0892521627 |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.367 |
| Item number | N782 |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Ruddell, Richard L. |
| 245 ## - TITLE STATEMENT | |
| Title | Developments in semiconductor micro lithography III; V.135 |
| Remainder of title | |
| Statement of responsibility, etc. | ed. by Richard L. Ruddell et al. |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Washington |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | 1978 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | vi, 170p. |
| 490 ## - SERIES STATEMENT | |
| Series statement | Proceeding of the Society of Photo-Optical Instrumentation Engineers |
| Volume/sequential designation | V.135 |
| 500 ## - GENERAL NOTE | |
| General note | V.135 |
| 690 ## - LOCAL SUBJECT ADDED ENTRY--TOPICAL TERM (OCLC, RLIN) | |
| Topical term or geographic name as entry element | Semiconductors; Lithography |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Ciarlo, Dino. |
| 919 ## - | |
| -- | 019896 |
| 964 ## - | |
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| -- | |
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| -- | |
| -- | ED. |
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