Low Temperature Plasma Technology (Record no. 180763)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00604nam a2200193Ia 4500 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9781466509900 |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.56 |
| Item number | P14 (EE) |
| 245 ## - TITLE STATEMENT | |
| Title | Low Temperature Plasma Technology |
| Remainder of title | Methods and Applications |
| Statement of responsibility, etc. | ed. by Paul K Chu and Xinpei Lu |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | New York |
| Name of publisher, distributor, etc. | Taylor and Francis Group |
| Date of publication, distribution, etc. | 2014 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | vii, 481p |
| 690 ## - LOCAL SUBJECT ADDED ENTRY--TOPICAL TERM (OCLC, RLIN) | |
| Topical term or geographic name as entry element | Low temperature Plasmas; Low temperature Plasmas--Industrialapplications; Low temperature Plasmas--Scientific applications; |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Chu, Paul. K., ed. |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Lu Xinpei., ed. |
| 919 ## - | |
| -- | 193382 |
| 964 ## - | |
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| -- | EE |
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