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Thin films of TiO2 by MOCVD : precursor development, film growth and microstructure, optical and electrical properties

Gupta, Pranav.

Thin films of TiO2 by MOCVD : precursor development, film growth and microstructure, optical and electrical properties by Pranav Gupta - Bangalore : Indian Institute of Science, 2007. - viii, 51 p. : col. ill.

Included CD and references.

MSc(Engg);2007;Materials Research Centre.

Subjects--Topical Terms:
Thin films
Chemical vapour deposition
Metal oxide

Dewey Class. No.: 530.4175 / P07

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